Semiconductor integrated circuit device

A semiconductor integrated circuit device comprises:

• a semiconductor substrate;
• an internal circuit formed on the semiconductor substrate, a first potential and a second potential being supplied to the internal circuit, thereby applying an operating voltage to the internal circuit;
• a fuse disposed above a semiconductor region of a first conductivity type, and electrically connected to the internal circuit, the semiconductor region being supplied with the second potential and being formed in the semiconductor substrate, the fuse having a blow spot as a region in which cutting is adapted to occur, the fuse being interposed between a first wiring to which the second potential is supplied and a second wiring electrically connected to the internal circuit;
• a protective element formed in the semiconductor region of the first conductivity type and protecting the internal circuit in response to positive and negative abnormal voltages generated in the second wiring;
• and
• a guard ring containing a highly concentrated impurity of the first conductivity type and formed within the semiconductor region of the first conductivity type, the fuse being disposed so that the blow spot is located above a region surrounded with the guard ring, the protective element being formed in the semiconductor region of the first conductivity type outside the region surrounded with the guard ring.