Resist composition and patterning process using the same

A resist composition comprising

• (A) a silicone resin,
• (B) an acid generator,
• (C) an organic nitrogen-containing compound, and
• (D) an organic solvent,
• said silicone resin (A) being obtained through cohydrolytic condensation of a mixture comprising hydrolyzable silane monomers having the general formulae (1), (2) and (3):
• wherein
• is selected from the group consisting of the following formulae:
• R4 is a C1-C6 hydrocarbon group with a straight, branched or cyclic structure,
• R5 is an organic group selected from the group consisting of the following formulae:
• wherein R12 is hydrogen, fluorine, methyl or trifluoromethyl, R13 is hydrogen, fluorine, methyl or trifluoromethyl, and Prot. is a protecting group selected from the group consisting of the following formulae:
• wherein R9 is C1-C6 straight, branched or cyclic alkyl,
• wherein R10 is C2-C6 straight, branched or cyclic alkyl, norbornyl or adamantyl, and Me is methyl, and
• wherein R11 is C1-C6 straight or branched alkyl,
• R6 is as defined for R4,
• R7 is an organic group selected from the group consisting of the following formulae (5) and (6):
• wherein Y is an oxygen atom, sulfur atom or methylene group,
• R8 is as defined for R4,
• X is hydrogen, chlorine, bromine, or a straight, branched or cyclic C1-C6 alkoxy group,
• p is 0 or 1, q is 0 or 1, and r is 0 or 1.