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US 7,745,068 B2Granted
Binary photomask having a compensation layer
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Sik Jung, Hee-Bom Kim, Woo-Sung Han, Sung-Min Huh
Life of this patent
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Abstract
A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on a topology of the compensation layer and arranged on the transmission-prevention layer and/or the substrate.
Claims20
A binary photomask, comprising:
- a substrate;
- a transmission-prevention pattern arranged on the substrate to define a circuit pattern;
- and
- a compensation layer arranged on at least one of the substrate and the transmission-prevention pattern, and configured to change light transmitted through the binary photomask based on a topology of the compensation layer;
- wherein the topology of the compensation layer changes the light transmitted through the binary photomask to decrease the intensity of 0th-order light and to increase the intensity of 1st-order light.
2 more elements
A binary photomask, comprising:
- a substrate;
- a transmission-prevention pattern arranged on the substrate to define a circuit pattern;
- and
- a compensation layer arranged on at least one of the substrate and the transmission-prevention pattern, and configured to change light transmitted through the binary photomask based on a topology of the compensation layer;
- wherein the topology of the compensation layer changes the light transmitted through the binary photomask to increase the intensity of 1st-order light.
2 more elements
Dependencies are inferred from the claim text.