Method for reducing pillar structure dimensions of a semiconductor device
AssigneeSanDisk 3D LLC
InventorsYung-Tin Chen, Michael Chan, Paul Poon, Steven J. Radigan
Life of this patent
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Abstract
A method creates pillar structures on a semiconductor wafer and includes the steps of providing a layer of semiconductor. A layer of photoresist is applied over the layer of semiconductor. The layer of photoresist is exposed with an initial pattern of light to effect the layer of photoresist. The photoresist layer is then etched away to provide a photoresist pattern to create the pillar structures. The photoresist pattern is processed in the layer of photoresist after the step of exposing the layer of photoresist and prior to the step of etching to reduce the dimensions of the photoresist pattern in the layer of photoresist.
Claims8
A method of making a pillar structure, comprising:
- providing a positive resist layer over at least one underlying layer;
- exposing the resist layer through a mask a first time;
- forming a first set of holes in the photoresist layer after exposing the resist the first time;
- exposing the resist layer through a mask a second time after the step of forming the first set of holes;
- and
- forming a second set of holes in the resist layer after exposing the resist the second time;
- narrowing the first and the second sets of holes;
- thereafter forming a filler material in the first and the second sets of holes;
- removing the resist layer to leave a filler material pattern over the at least one underlying layer;
- and
- etching the at least one underlying layer using the filler material pattern as a mask to form a plurality of pillars in the at least one underlying layer.
A method of making a pillar structure, comprising:
- providing a positive resist layer over at least one underlying layer;
- exposing the resist layer through a mask a first time;
- exposing the resist layer through a mask a second time;
- and
- forming holes in the resist layer after exposing the resist the first and the second time;
- narrowing the holes;
- thereafter forming a filler material in the holes;
- removing the resist layer to leave a filler material pattern over the at least one underlying layer;
- and
- etching the at least one underlying layer using the filler material pattern as a mask to form a plurality of pillars in the at least one underlying layer.
Dependencies are inferred from the claim text.