Semiconductor device and method for fabricating the same

A method for fabricating a semiconductor device having a plurality of concave capacitors, said method comprising the steps of:

• (a) forming an insulating film with a plurality of trenches on a semiconductor substrate;
• (b) forming a plurality of lower electrodes so as to only cover inner surfaces of said trenches in a conforming manner not completely burying said trenches;
• (c) forming a capacitive insulating film on the plurality of lower electrodes;
• and
• (d) forming an upper electrode covering the surfaces of the plurality of lower electrodes from above with the capacitive insulating film interposed between the upper electrode and the plurality of lower electrodes and have a stress-relieving part,
• wherein each said capacitor comprises one of said lower electrodes, said capacitive insulating film and said upper electrode,
• said upper electrode covers the surfaces of said insulating film located outside said plurality of trenches, and
• said stress-relieving part is formed in a part of said upper electrode including the surface thereof and covering the surfaces of said insulating film located outside said plurality of trenches.