Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program

A computer program for pattern formation, the program being stored in a computer readable medium, the program which when executed by a processor will perform a process comprising:

• preparing a first database by allocating property data to predetermined positions assigned in a chip;
• storing data regarding the allocating in the first database in a memory;
• preparing a second database by pairing a cell name of a cell extracted from hierarchical processing of design pattern data and arrangement positional data of the cell;
• storing data regarding the pairing in the second database in the memory;
• allocating the property data to the cell based on the first database and the second database, and executing mask data processing based on at least one of the property data, to prepare for a rearrangement of the cell;
• and
• rearranging on the chip the cell subjected to the mask data processing,
• wherein the property data contains at least one selected from the group consisting of an aberration of an exposure device, a property of an illumination, a property of a projection lens, and a pattern coverage in a shot.

A semiconductor device manufacturing method comprising:

• preparing mask pattern data based on design pattern data, which comprises:
• preparing a first database by allocating property data to predetermined positions assigned in a chip;
• storing, by a processor, data regarding the allocating in the first database in a memory;
• preparing a second database by pairing a cell name of a cell extracted from hierarchical processing of the design pattern data and arrangement positional data of the cell;
• storing, by the processor, data regarding the pairing in the second database in the memory;
• allocating property data to the cell based on the first database and the second database, and executing mask data processing based on at least one of the property data, to prepare for a rearrangement of the cell;
• and
• rearranging on the chip the cell subjected to the mask data processing;
• preparing a mask based on the mask pattern data;
• forming a predetermined film on a semiconductor wafer, followed by patterning the predetermined film through the mask by lithography to form wiring lines;
• dicing the semiconductor wafer to form a plurality of chips;
• mounting each of the plurality of chips on a predetermined package,
• wherein the property data contains at least one selected from the group consisting of an aberration of an exposure device, a property of an illumination, a property of a projection lens, and a pattern coverage in a shot.