Pattern writing apparatus and pattern writing method

A pattern writing apparatus for writing a pattern on a photosensitive material by light irradiation on said photosensitive material, comprising:

• a light emitting part for emitting light to a photosensitive material;
• an irradiation region moving mechanism for moving an irradiation region group on said photosensitive material, said irradiation region group irradiated with light emitted from said light emitting part;
• and
• a control part for controlling movement of said irradiation region group and light irradiation on respective irradiation regions included in said irradiation region group to perform writing on said photosensitive material by applying light to each position on said photosensitive material while passing a plurality of irradiation regions over said each position, wherein
• light irradiation is performed on a preceding strip region on said photosensitive material by controlling light irradiation on a preceding irradiation region group by said light emitting part and moving said preceding irradiation region group in parallel with a main scan direction, and light irradiation is performed on a following strip region which is adjacent to and partially overlaps with said preceding strip region by controlling light irradiation on a following irradiation region group by said light emitting part and moving said following irradiation region group in parallel with said main scan direction, and
• said preceding irradiation region group or said following irradiation region group continuously passes each position of a non-overlapping area which belongs to said preceding strip region or said following strip region in a constant time, and a cumulative passage time in which said preceding irradiation region group and said following irradiation region group pass each position of an overlapping area between said preceding strip region and said following strip region is shorter than said constant time.