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AssigneeSandia Corporation
InventorsGeorg Aigeldinger, Dawn M. Skala, Stewart K. Griffiths, Albert Alec Talin, Matthew W. Losey, Chu-Yeu Peter Yang
Estimating the term…
The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
A lithographic mask comprising a vitreous carbon substrate, wherein a surface of the vitreous carbon substrate comprises a microscopically roughened surface and a patterned metal X-ray absorber layer adhering to the microscopically roughened surface.
A lithographic mask comprising a vitreous carbon substrate, wherein a surface of the vitreous carbon substrate is etched in a reactive ion oxygen plasma to provide a microscopically roughened surface, and wherein an X-ray resist material is affixed to the microscopically roughened surface.
A method for preparing a microfabricated device, comprising the steps of.
Dependencies are inferred from the claim text.