US 7,608,299 B2 · Process for the deposition by CVD of a silver film on a substrate

Abstract

The invention relates to the deposition of thin silver films on various substrates, particularly superconductor substrates. The method consists of CVD deposition of silver on a substrate with the aid of a silver precursor solution. The silver precursor is an RCO2Ag silver carboxylate, wherein R is a linear or branched radical having 3-7 carbon atoms, used in the form of an organic liquid solution. The precursor concentration of the solution ranges from 0.01 to 0.6 mol/l. The organic liquid comprises an amine and/or a nitrile and, optionally, a solvent whose evaporation temperature is lower than the decomposition temperature of the precursor. The percentage by volume of the amine and/or nitrile in the organic liquid is more than 0.1%.

Claims10

Dependent claims

A process for depositing a silver film on a substrate, comprising depositing silver on the substrate by chemical vapor deposition, in an oxygen atmosphere or in a hydrogen atmosphere, of a solution comprising a silver precursor, an amine and/or a nitrile, and a solvent, wherein:

the silver precursor is a silver carboxylate RCO2Ag in which R is a linear or branched alkyl radical that has 3 to 7 carbon atoms;
the concentration of the silver precursor in the solution is between 0.01 and 0.6 mol/l;
optionally the solvent has an evaporation temperature that is less than the decomposition temperature of the silver precursor;
and
the percentage by volume of the amine and/or the nitrile in the solvent is more than 0.1%.

2 more elements

Dependencies are inferred from the claim text.

Process for the deposition by CVD of a silver film on a substrate

Life of this patent

Process for the deposition by CVD of a silver film on a substrate

Life of this patent

Abstract

Claims10