Capacitor structure for integrated circuit
AssigneeVIA Technologies, Inc.
InventorsChun-Sheng Chen, Ying-Che Tseng
Life of this patent
Estimating the term…
Abstract
A capacitor structure for an integrated circuit. An insulating layer is disposed on a substrate. A first conductive line is embedded in a first level of the insulating layer. A second conductive line is embedded in a second level of the insulating layer lower than the first level and has a projection onto the substrate completely covered by the first conductive line. A third conductive line is embedded in the second level of the insulating layer and separated from the second conductive line by a predetermined space, and has a projection onto the substrate partially covered by the first conductive line. The second conductive line is coupled to the first conductive line by at least one first conductive plug and has a polarity opposite to the third conductive line.
Claims21
A capacitor structure for an integrated circuit, comprising:
- an insulating layer disposed on a substrate;
- a first conductive line embedded in a first level of the insulating layer;
- a second conductive line embedded in a second level of the insulating layer lower than the first level and having a projection onto the substrate completely covered by the first conductive line;
- and
- a third conductive line embedded in the second level of the insulating layer, separated from the second conductive line by a predetermined space and having a projection onto the substrate partially covered by the first conductive line;
- wherein the second conductive line is coupled to the first conductive line by at least one first conductive plug and has a polarity opposite to the third conductive line;
- wherein the first, second and third conductive lines have first, second and third line widths, respectively, and the first line width is substantially equal to the sum of the second and third line widths.
A capacitor structure for an integrated circuit, comprising:
- an insulating layer disposed on a substrate;
- a first conductive line pattern embedded in a first level of the insulating layer and comprising a plurality of parallel first conductive lines separated by a first space, wherein the adjacent first conductive lines have opposing polarities;
- and
- a second conductive line pattern embedded in a second level of the insulating layer lower than the first level and comprising a plurality of parallel second conductive lines separated by the first space;
- wherein the second conductive line pattern shifts along a predetermined direction with respect to the first conductive line pattern by a second space and each first conductive line is coupled to a corresponding and shifted second conductive line by at least one first conductive plug;
- wherein the first and second conductive line patterns have substantially the same line width, and the second space is narrower than the line width and wider than the first space.
Dependencies are inferred from the claim text.