Exposure apparatus, exposure method, and method for producing device

An exposure method, comprising:

• supplying a liquid medium from an opening through a porous material;
• moving a substrate relative to the opening;
• and
• exposing the substrate with an exposure beam through the liquid medium supplied from the opening through the porous material.

A liquid immersion exposure apparatus comprising:

• an optical member through which an exposure beam passes;
• a flow passage in which a liquid flows, the flow passage being in fluidic communication with a space between the optical member and an object opposite to the optical member;
• a porous material disposed in the flow passage;
• an opening through which the flow passage is in fluidic communication with the space, and from which the liquid is supplied to the space;
• and
• a holder which holds the object and which is movable relative to the optical member and the opening.

A device manufacturing method comprising:

• supplying a liquid medium from an ooening through a porous member;
• moving a substrate relative to the opening;
• and
• exposing the substrate with a patterned beam through the liquid medium supplied from the opening through the porous member.