Reticle alignment and overlay for multiple reticle process
AssigneeLam Research Corporation
InventorsS. M. Reza Sadjadi, Nicolas Bright
Life of this patent
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Abstract
A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts is generated from the feature layout where each reticle layout of the plurality of reticle layouts has a reticle layout pitch and where each reticle layout pitch is at least twice the feature layout pitch.
Claims17
A method, comprising:
- receiving a feature layout with a feature layout pitch;
- and
- generating a plurality of reticle layouts from the feature layout wherein each reticle layout of the plurality of reticle layouts has a reticle layout pitch and wherein each reticle layout pitch is at least twice the feature layout pitch, wherein a first reticle layout of the plurality of reticle layouts comprises a first alignment mark and wherein a second reticle layout of the plurality of reticle layouts comprises a first alignment mark to match the first alignment mark of the first reticle layout and a second alignment mark which is not matched by the first reticle layout.
The method, as recited in 4, wherein the first set of features are etched to a same depth as the second set of features.
The method, as recited in 11, wherein the first set of features are etched to a same depth as the second set of features and wherein the performing the shrink correction provides for eliminating different requirements for the isolated and dense features.
An apparatus comprising computer readable media comprising:
- computer readable code for receiving a feature layout with a feature layout pitch;
- and
- computer readable code for generating a plurality of reticle layouts from the feature layout, wherein each reticle layout of the plurality of reticle layouts has a reticle layout pitch and wherein each reticle layout pitch is at least twice the feature layout pitch, wherein a first reticle layout of the plurality of reticle layouts comprises a first alignment mark and wherein a second reticle layout of the plurality of reticle layouts comprises a first alignment mark to match the first alignment mark of the first reticle layout and a second alignment mark which is not matched by the first reticle layout.
Dependencies are inferred from the claim text.