Ampoule splash guard apparatus

An apparatus for generating a precursor gas used in a vapor deposition process system, comprising:

• a canister containing a body assembly and a lid;
• a gas inlet positioned on the canister and configured to accept a carrier gas flow into the canister, wherein the gas inlet comprises an inlet stem disposed within the canister and has a tapered tip at a first angle;
• a gas outlet positioned on the lid and configured to accept a process gas flow from the canister, wherein the tapered tip of the inlet stem is positioned to face a direction substantially away from the gas outlet;
• and
• a splash guard attached to an inner surface of the canister and extending from the inner surface to obstruct a liquid precursor from entering the gas outlet.

An apparatus for generating a precursor gas used in a vapor deposition process system, comprising:

• a canister containing a body assembly and a lid;
• a gas inlet positioned on the canister and configured to accept a carrier gas flow into the canister;
• a gas outlet configured to receive a process gas flowing from the canister;
• an outlet stem connected to the gas outlet containing a tapered tip having a first angle;
• an inlet stem connected to the gas inlet and disposed within the canister, wherein the inlet stem comprises a tapered tip at a second angle and is positioned such that the angle of the tapered tip faces a direction substantially away from the gas outlet;
• and
• a splash guard within the canister containing a surface positioned at a second angle, wherein the first angle and the second angle are equal or substantially equal to each other.

An apparatus for generating a precursor gas used in a vapor deposition process system, comprising:

• a canister containing a lid and a body assembly configured to hold a liquid precursor;
• a gas inlet positioned on the canister and configured to accept a carrier gas flow into the canister, the gas inlet comprising a gas inlet stem disposed within the canister and having a tapered tip at a first angle;
• a gas outlet positioned on the lid and configured to accept a process gas flow from the canister, wherein the tapered tip of the inlet stem is positioned to face a direction substantially away from the gas outlet;
• and
• a splash guard positioned within the canister and positioned between the gas outlet and a bottom surface of the body assembly, wherein the splash guard is positioned to substantially obstruct the liquid precursor from entering the gas outlet.

An apparatus for generating a precursor gas used in a vapor deposition process system, comprising:

• a canister containing a body assembly and a lid;
• a gas inlet positioned on the canister and configured to accept a carrier gas flow into the canister, the gas inlet comprising a gas inlet stem disposed within the canister and having a tapered tip at a first angle;
• a gas outlet positioned on the lid and configured to accept a process gas flow from the canister, wherein the tapered tip of the inlet stem is positioned to face a direction substantially away from the gas outlet;
• and
• a splash guard attached to an inner surface of the canister and extending from the inner surface to obstruct a liquid precursor from entering the gas outlet, wherein the splash guard is at a second angle within a range from about 10° to about 50° from an interior lid surface.