Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel Beckers, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Ferdy Migchelbrink
Life of this patent
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Abstract
A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
Claims32
A lithographic apparatus, comprising:
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
- a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid;
- and
- a protrusion which surrounds the projection system and is on the barrier member such that a surface of the protrusion is closer to the projection system than a part of the barrier member on a radially outward side of the protrusion is to the surface of the projection system, or the protrusion is on the projection system such that a surface of the protrusion is closer to the barrier member than a part of the projection system on a radially outward side of the protrusion is to the surface of the barrier member;
- wherein, in a use, liquid simultaneously contacts the surface of the protrusion and a surface of the projection system facing the surface of the protrusion when the protrusion is on the barrier, or simultaneously contacts the surface of the protrusion and a surface of the barrier member facing the surface of the protrusion when the protrusion is on the projection system.
A lithographic apparatus, comprising:
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
- and
- a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid,
- wherein a surface of the barrier member, a surface of the projection system, or both, is shaped such that there is a step increase in a distance between the two to increase resistance against a meniscus of a liquid when contained in the reservoir passing, between the surface of the barrier member and the surface of the projection system, radially outwardly of that step increase.
A device manufacturing method comprising projecting a patterned beam of radiation through a liquid onto a substrate using a projection system, wherein the liquid is confined to a reservoir between the projection system and the substrate at least in part by a barrier member and wherein a meniscus of the liquid either extends between a protrusion on the barrier member and the projection system wherein the protrusion is closer to the projection system than a part of the barrier member radially outwardly of the protrusion is to the surface of the projection system, or extends between a protrusion on the projection system and the barrier member wherein the protrusion is closer to the barrier member than a part of the projection system radially outwardly of the protrusion is to the surface of the barrier member.
A device manufacturing method comprising projecting a patterned beam of radiation through a liquid onto a substrate using a projection system wherein the liquid is contained between the projection system and the substrate at least in part by a barrier member, the barrier member, the projection system, or both, shaped such that there is a step increase in a distance between the barrier member and the projection system and a meniscus extends on one side of the step between the barrier member and the projection system.
A lithographic apparatus, comprising:
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate;
- a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid;
- and
- a protrusion which surrounds the projection system and is on the projection system such that a surface of the protrusion is closer to the barrier member than a part of the projection system on a radially outward side of the protrusion is to the surface of the barrier member.
Dependencies are inferred from the claim text.