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US 7,411,654 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
Life of this patent
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Abstract
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Claims58
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between a final element of the projection system and the substrate table, the barrier member being configured to contain a liquid in the space between the final element and the substrate, the barrier member comprising a plurality of liquid inlets facing toward an optical axis of the projection system and configured to provide liquid to the space and a liquid outlet on a side of the optical axis opposite the liquid inlets and configured to remove liquid from the space, wherein the liquid inlets and/or the liquid outlet extend around a fraction that is less that about ½ of the inner periphery of the surface.
1 more element
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a barrier member having a surface surrounding a space between a final element of the projection system and the substrate table, the barrier member being configured to contain a liquid in the space between the final element and the substrate, the barrier member comprising a liquid inlet configured to provide liquid to the space, the inlet comprising a chamber in the barrier member separated from the space by a plate member, the plate member forming at least part of the surface and having a plurality of through holes extending between the chamber and the space for the flow of liquid therethrough.
1 more element
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to provide liquid to a space between a final element of the projection system and a substrate, wherein the liquid supply system comprises an extractor configured to remove liquid from the space, the extractor comprising a two dimensional array of orifices through which the liquid can be extracted from the space.
1 more element
A device manufacturing method, comprising;
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein a barrier member has a surface which surrounds a space between a final element of the projection system which projects the patterned beam and the substrate, the barrier member being configured to contain a liquid in the space between the final element and the substrate;
- providing liquid to the space through a plurality of liquid inlets facing toward an optical axis of the projection system;
- and
- removing liquid from the space via a liquid outlet on a side of the optical axis opposite the liquid inlets, wherein the liquid inlets and/or the liquid outlet extend around a fraction that is less than about ½ of the inner periphery of the surface.
1 more element
A device manufacturing method comprising,
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein a liquid is provided between a final element of the projection system and the substrate, the liquid being contained by a barrier member having a surface, the liquid being provided to the space through an inlet which comprises a chamber in the barrier member separated from the space by a plate member and the plate member having a plurality of through holes extending between the chamber and the space through which the liquid flows.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate using a projection system, wherein liquid is provided to a space between a final element of a projection system and a substrate and liquid being extracted from the space through an extractor which comprises a two dimensional array of orifices.
Dependencies are inferred from the claim text.