Method of fabricating suspended structure
AssigneeTouch Micro-System Technology Inc.
InventorsYao-Tian Chow, Pin-Ting Liu
Life of this patent
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Abstract
A substrate having a sacrificial layer and a structural layer disposed on the front surface of the substrate is provided. Thereon an opening is formed on the back surface of the substrate and the sacrificial layer is exposed partially. A wet etching process is performed to etch the sacrificial layer via the opening to form a suspended structure. Finally, a gas injection process is performed. The gas injection process comprises blowing a gas on the suspended structure via the opening and consequently preventing the suspended structure from sticking to the substrate.
Claims9
A method of fabricating a suspended structure, comprising:
- providing a substrate comprising a sacrificial layer and a structural layer on a front surface of the substrate;
- forming an opening on a back surface of the substrate, the opening partially exposing the sacrificial layer;
- performing a wet etching process to etch the sacrificial layer and accordingly the structural layer to form a suspended structure;
- and
- performing a gas injection process comprising blowing a gas on the suspended structure via the opening and consequently preventing the suspended structure from sticking to the substrate.
A method of fabricating a suspended structure, comprising:
- providing a substrate comprising a sacrificial layer and a structural layer on a front surface of the substrate;
- performing a wet etching process to etch the sacrificial layer and accordingly the structural layer to form a suspended structure;
- performing a wet cleaning process comprising using a cleaning solution to clean the substrate and the suspended structure;
- and
- performing a gas injection process comprising blowing a gas on the suspended structure and consequently preventing the suspended structure from sticking to the substrate.
Dependencies are inferred from the claim text.