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US 7,408,236 B2Granted
Method for non-damaging charge injection and system thereof
AssigneeNth Tech Corporation
InventorMichael D. Potter
Life of this patent
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Abstract
A method and system for injecting charge includes providing a first material on a second material and injecting charge into the first material to trap charge at an interface between the first and second materials. The thickness of the first material is greater than a penetration depth of the injected charge in the first material.
Claims6
A system for injecting charge, the system comprising:
- a first material on a second material with an interface between the first and second materials, wherein the first and second materials are dissimilar insulators;
- a charge source positioned to inject charge into the first material to trap charge at an interface between the first and second materials, wherein a thickness of the first material is greater than a penetration depth of the injected charge in the first material;
- a conductor on the second material;
- and
- a power source that applies an accelerating potential above 3800 eV across the conductor and the charge source for the injected charge, wherein the charge source is an electron gun.
2 more elements
Dependencies are inferred from the claim text.