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US 7,079,225 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohannes Jacobus Matheus Baselmans, Anastasius Jacobus Anicetus Bruinsma, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink
Life of this patent
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Abstract
Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
Claims17
A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
- an array of cylindrical lenses arranged so that their elongated axes are parallel and so that each cylindrical lens of the array of cylindrical lenses receives a respective portion of the beam perpendicular to its elongated axis, the array of cylindrical lenses dividing the beam of radiation into a plurality of sub-beams of radiation;
- an array of individually controllable elements being configured such that the plurality of sub-beams of radiation are directed onto corresponding individually controllable elements in said array of individually controllable elements to pattern the plurality of sub-beams of radiation;
- and
- a projection system that projects the patterned plurality of sub-beams of radiation onto a target portion of a substrate.
2 more elements
A device manufacturing method, comprising:
- (a) providing a beam of radiation perpendicular to respective elongated axes of an array of cylindrical lenses;
- (b) dividing the beam of radiation into a plurality of sub-beams using the array of cylindrical lenses;
- (c) patterning each one of the plurality of said sub-beams using selected individually controllable elements in an array of individually controllable elements;
- (d) projecting the patterned sub-beams of radiation onto a target portion of a substrate.
1 more element
Dependencies are inferred from the claim text.