Optics for extreme ultraviolet lithography
AssigneeIntel Corporation
InventorsManish Chandhok, Bryan J. Rice, Robert Bristol
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Abstract
According to an embodiment of the invention, extreme ultraviolet (EUV) photolithography is performed using lobster eye transmission optics. A light source, such as a source plasma, is located at the center of a circle. Several mirror segments are arranged on an arc of the circle. The mirror segments may be arranged so that the light generated by the light source is collimated after being reflected. The light source may be a source plasma capable of generating EUV photons.
Claims23
A system for performing photolithography comprising:
- a light source to generate photons;
- a reticle to mask the photons and expose a pattern onto a layer of photoresist;
- and
- an array of mirrors mounted along an arc of a circle surrounding the light source, the mirrors are positioned to collimate the photons generated by the light source and direct the photons through the reticle onto the layer of photoresist.
A system for performing photolithography comprising:
- a light source;
- an array of mirrors to reflect light generated by the light source, the mirrors are positioned about a circle having a center, wherein the light source is located at the center of the circle;
- a condenser to receive the light reflected by the mirrors;
- and
- a reticle to mask the light reflected by the mirrors and directed through the condenser.
A method for performing photolithography comprising:
- generating photons using a light source;
- reflecting the photons with an array of mirrors positioned on a circle having a center, wherein the light source is located at the center of the circle;
- masking the reflected photons using a reticle;
- and
- exposing a photoresist layer with the photons.
Dependencies are inferred from the claim text.