Method of forming a low voltage drive ferroelectric capacitor
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYuan-Chieh Tseng, Chao-Hsiung Wang, Tai-Bor Wu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYuan-Chieh Tseng, Chao-Hsiung Wang, Tai-Bor Wu
Estimating the term…
A method of forming a low-voltage drive thin film ferroelectric capacitor includes the steps of depositing a ferroelectric and platinum thin film dielectric layer over a bottom electrode, annealing the dielectric layer, wherein a nanocomposite layer is formed including nanoparticles of platinum and forming a top electrode over the dielectric layer. An integrated circuit is also provided including a ferroelectric capacitor. The capacitor includes a bottom electrode formed over a substrate and a ferroelectric and platinum thin film nanocomposite dielectric layer formed over the bottom electrode, wherein the nanocomposite layer includes nanoparticles of platinum. A top electrode is formed over the dielectric layer.
A method of forming a low-voltage drive thin film ferroelectric capacitor, comprising the steps of:
A method of forming a low-voltage drive thin film ferroelectric capacitor, comprising the steps of:
A method of forming a low-voltage drive thin film ferroelectric capacitor, comprising the steps of:
A method of forming a low-voltage drive thin film ferroelectric capacitor, comprising the steps of:
A method of forming a low-voltage drive thin film ferroelectric capacitor, comprising the steps of:
Dependencies are inferred from the claim text.