CVD coating device
AssigneeAixtron SE
InventorsHolger Jürgensen, Johannes Käppeler, Gerhard Karl Strauch
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Abstract
The invention relates to a device for depositing especially, crystalline layers onto one or more, especially, also crystalline substrates in a process chamber using reaction gases which are guided into said process chamber, where they undergo pyrolytic reaction. The device has a heatable support plate wherein at least one substrate holder lies loosely, especially rotationally, with its surface flush with the surroundings. A compensation plate which adjoins the at least one substrate holder, following the contours of the same, is provided on the support plate in order to keep the isothermal profile on the support plate as flat as possible.
Claims13
A device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates in a process chamber by means of reaction gases which are introduced into the process chamber, where they react pyrolytically, having a heatable carrier plate, in which at least one substrate holder rests loosely in a carrier plate cutout, in particular rotatably, with respect to the carrier plate,
- at least one compensation plate which is located on the carrier plate and adjoins the at least one substrate holder such that it follows the contours;
- a centering ring located in the carrier plate cutout and surrounding the substrate holder, and
- a covering ring which is disposed over the centering ring and at least a portion of the substrate holder and is flush with the substrate holder,
- wherein, the top surface of the substrate holder and the covering ring are flush with the compensation plate.
A device for depositing crystalline layers on a substrate in a process chamber by means of reaction gases introduced into the process chamber comprising:
- a heatable carrier plate having at least one cutout, the carrier plate being rotatable with respect to the reaction gas;
- at least one compensation plate positioned on the carrier plate and adjoining the at least one substrate holder, said at least one compensation plate substantially following the contours,
- at least one substrate holder loosely positioned in the at least one cutout, being rotatable with respect to the carrier plate and being flush with the top surface of the compensation plate,
- a centering ring located in the cutout and encircling the substrate holder, and a covering ring positioned over at least the centering ring and being flush with the substrate holder.
Dependencies are inferred from the claim text.