Selectable capacitance apparatus and methods
AssigneeIntel Corporation
InventorsPeir Chu, Steve Schiveley, Aaron J. Steyskal, Mike Greenwood, Tao Liu
Life of this patent
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AssigneeIntel Corporation
InventorsPeir Chu, Steve Schiveley, Aaron J. Steyskal, Mike Greenwood, Tao Liu
Estimating the term…
A user-selectable integrated circuit capacitance apparatus may include first and second electrodes defining a first fractal geometry, along with second and third electrodes defining a second fractal geometry. A dielectric may be located adjacent to the first and third electrodes. A method of fabricating the apparatus may include selecting a dielectric layer, forming the first and second electrodes so as to define the first fractal geometry on the dielectric layer, and then forming third and fourth electrodes so as to define a second fractal geometry on the dielectric layer. A circuit package may include external package connections connected to the electrodes of the apparatus. A system may include the apparatus coupled to a wireless transceiver by way of a power supply trace.
An apparatus, comprising:
A circuit package, comprising:
An apparatus, comprising:
Dependencies are inferred from the claim text.