Micromachined electromechanical device
AssigneeAgency for Science, Technology and Research
InventorsKui Yao, Xujiang He, Jian Zhang, Santiranjan Shannigrahi
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Abstract
A method for fabricating a MEMS device comprises providing a substrate having a back side, a front side opposite to the back side and a periphery portion. A desired microstructure is formed on the back side of the substrate. The substrate is then supported for rotation. A precursor solution is deposited on the front side of the substrate during rotation so that a thin film layer may be formed thereon. During formation of the thin film layer, the substrate is supported and rotated that the microstructure formed on the back side is protected.
Claims15
A method of fabricating a membrane structure for micro-machined devices, the method comprising:
- providing a substrate;
- forming a microstructure on a back side of the substrate;
- depositing a precursor solution on a front side of the substrate after forming the microstructure while rotating the substrate to form a thin film layer thereon;
- and
- seating a periphery portion of the substrate over a base plate to form a spacing between the microstructure and the base plate.
A method of fabricating a membrane structure for micro-machined devices, the method comprising:
- providing a substrate;
- forming a microstructure on a back side of the substrate;
- depositing a precursor solution on a front side of the substrate after forming the microstructure while rotating the substrate to form a thin film layer thereon;
- and
- forming a high-pressure zone surrounding the periphery portion of the substrate to prevent the precursor solution from contacting the microstructure.
A method of fabricating a membrane structure for micro-machined devices, the method comprising:
- providing a substrate;
- forming a microstructure on a back side of the substrate;
- depositing an intermediate layer and a first electrode layer on the front side of the substrate;
- and
- depositing a precursor solution on a front side of the substrate after forming the microstructure while rotating the substrate to form a thin film layer thereon.
A method of fabricating a membrane structure for micro-machined devices, the method comprising:
- providing a substrate;
- forming a microstructure on a back side of the substrate;
- depositing a precursor solution on a front side of the substrate after forming the microstructure while rotating the substrate to form a thin film layer thereon,
- wherein the micro-machined device is a piezoelectric based MEMS device and the thin film layer comprises a piezoelectric film.
A method of fabricating a membrane structure for micro-machined devices, the method comprising:
- providing a first substrate and a second substrate having each a back side, a front side and periphery portion;
- forming a microstructure on the back side of the first and the second substrates,
- joining the first and the second substrates with the back sides facing each other;
- supporting the joint first and the second substrates for rotation;
- and
- depositing a first precursor solution on the front side of the first substrate, rotating the joint substrate to form a first thin film layer on the front side of the first substrate, depositing a second precursor solution on the front side of the second substrate, and rotating the joint substrate to form a second thin film layer on the front side of the second substrate.
Dependencies are inferred from the claim text.