Systems for buried electrical feedthroughs in a glass-silicon MEMS process
AssigneeHoneywell International Inc.
InventorsRobert D. Horning, Jeffrey A. Ridley
Life of this patent
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AssigneeHoneywell International Inc.
InventorsRobert D. Horning, Jeffrey A. Ridley
Estimating the term…
A method for providing conductive paths into a hermetically sealed cavity is described. The sealed cavity is formed utilizing a silicon-glass micro-electromechanical structure (MEMS) process and the method includes forming recesses on a glass substrate everywhere that a conductive path is to pass into the cavity, and forming conductive leads in and around the recesses. A glass layer is deposited over the substrate, into the recesses, and over the conductive leads and then planarized to expose portions of the conductive leads. A sealing surface is formed on at least a portion of the glass layer. Silicon is then bonded to the sealing surface of the planarized glass layer, the wafer being configured such that a portion of each lead is within the sealed cavity and a portion of each lead is outside the sealed cavity.
A structure having a hermetically sealed cavity therein, said structure having at least one electrically conductive path passing from outside of the sealed cavity to inside the sealed cavity, said structure comprising:
A micro electromechanical system (MEMS) gyroscope comprising:
A structure having a hermetically sealed cavity therein, said structure having at least one electrically conductive path passing from outside of the cavity to the sealed cavity, said structure comprising:
Dependencies are inferred from the claim text.