Back to results
US 6,787,968 B2Granted
Freestanding polymer MEMS structures with anti stiction
AssigneeCalifornia Institute of Technology
InventorsYu-Chong Tai, Tze-Jung Yao, Xing Yang
Life of this patent
Estimating the term…
Abstract
An anti stiction structure for cantilever formation technique. In one embodiment, the polymer cantilever is prevented from sticking to the substrate by at amortized stick layer on the substrate during formation that is later removed as a sacrificial layer. In another embodiment, the cantilever includes downwardly extending legs.
Claims18
A method, comprising:
- forming a sacrificial layer of material on a substrate;
- covering said sacrificial layer of material with a polymer material;
- removing said sacrificial layer to form a cantilevered polymer structure over a substrate using micromachining techniques;
- forming at least one structure between said polymer structure and said substrate which avoids said polymer structure sticking to said substrate after said removing;
- forming a plurality of leg portion, extending between an extending portion of said cantilevered polymer structure, and said substrate;
- and
- an additional etching to free said leg portions from said substrate.
4 more elements
A method, comprising:
- obtaining a silicon substrate;
- and
- forming a cantilevered polymer portion over said silicon substrate, and unsupported relative to said silicon substrate;
- preventing said cantilevered polymer portion from sticking to said silicon substrate;
- wherein said preventing comprises forming legs connected to said cantilevered polymer portion, said legs extending towards said silicon substrate;
- and
- wherein said forming legs comprises forming legs which extend to said substrate and may stick to said substrate, and subsequently etching to free said legs from said substrate.
4 more elements
A structure, comprising:
- a silicon substrate;
- and
- a polymer cantilevered element, overlying said silicon substrate, and forming a cavity between a bottom surface of said cantilevered element and said silicon substrate, said polymer cantilevered element having a thickness less than 100 microns, and a length greater than 100 microns;
- and
- further comprising an indentation in said substrate in an area of said leg, wherein said leg is separated from said substrate.
2 more elements
A method, comprising:
- forming a sacrificial layer of material on a substrate;
- covering said sacrificial layer of material with a polymer material;
- removing said sacrificial layer to form a cantilevered polymer structure over a substrate using micromachining techniques;
- forming at least one structure between said polymer structure and said substrate which avoids said polymer structure sticking to said substrate after said removing;
- wherein said forming at least one structure comprises forming an anti stick layer on said substrate, said anti stick layer formed of a different material than a material of said substrate;
- wherein said anti stick layer is part of a sacrificial layer, and further comprising removing said sacrificial layer;
- further comprising a forming a plurality of leg portions, extending between an extending portion of said cantilevered polymer structure and said substrate;
- and
- etching away portions of said substrate which abut near said leg portions.
6 more elements
A method, comprising:
- obtaining a silicon substrate;
- forming a cantilevered polymer portion over said silicon substrate, and unsupported relative to said silicon substrate;
- preventing said cantilevered polymer portion from sticking to said silicon substrate;
- and
- wherein said etching to free said legs comprises forming removing a portion of said substrate around said legs to free the legs from the substrate.
2 more elements
A method, comprising:
- obtaining a silicon substrate;
- forming a cantilevered polymer portion over said silicon substrate, and unsupported relative to said silicon substrate;
- preventing said cantilevered polymer portion from sticking to said silicon substrate;
- wherein said etching to free said legs comprises forming removing a portion of said substrate around said legs;
- and
- wherein said etching comprises BrF3 etching to remove a portion of said substrate around said legs.
3 more elements
Dependencies are inferred from the claim text.