Exposure method, exposure apparatus and device producing method

An exposure apparatus that transfers a pattern of a first object onto a second object with an exposure beam generated by an exposure light source, comprising:

• an illumination system which is disposed in an optical path of the exposure beam and which irradiates the first object with the exposure beam;
• a projection system which is disposed in the optical path of the exposure beam and which irradiates a second object with the exposure beam that has passed through the pattern of the first object;
• a first detector which is disposed in the illumination system and which detects a light amount of the exposure beam at a measuring point in the illumination system;
• a second detector which is disposed at an image plane side of the projection system and which detects a light amount of the exposure beam on the image plane of the projection system;
• an exposure amount control system which is connected to the first detector and the second detector, which stores a correlation between an output of the first detector and an output of the second detector and which controls an integrated exposure amount with respect to the second object based on the output of the first detector and the correlation;
• and
• a forecasting control system which is connected to the exposure amount control system, which obtains, for each exposure process condition for exposing the second object, control parameters for forecasting a variation amount of a transmittance of an optical system disposed between the measuring point and the second object, which forecasts a variation amount of a transmittance of the projection system in accordance with the obtained control parameters, and which renews the correlation based on the forecasted variation amount of transmittance.