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US 6,656,666 B2Granted
Topcoat process to prevent image collapse
AssigneeInternational Business Machines Corporation
InventorsJohn P. Simons, Kenneth J. McCullough, Wayne M. Moreau, Charles J. Taft
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Abstract
The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.
Claims16
A method of stabilizing a developed resist image comprising:
- providing a resist image;
- immersing said resist image in a developing fluid;
- maintaining the upper surface of said image in contact with said developing fluid;
- rinsing said resist image with a rinse fluid while maintaining said upper surface in contact with said rinse fluid;
- overcasting said image with a stabilizing film while said resist image remains immersed in said rinse fluid;
- displacing said rinse fluid in contact with said overcast image with a low surface tension final displacing fluid, wherein said displacing fluid is a solvent for said film;
- and
- critical point drying said final displacing fluid thereby removing said film.
5 more elements
Dependencies are inferred from the claim text.