Resist stripping agent and process of producing semiconductor devices using the same
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsKazuto Ikemoto, Hisaki Abe, Taketo Maruyama, Tetsuo Aoyama
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Abstract
A resist stripping agent comprising a specific alkanolamine having at least one functional group represented by the following formula (I): wherein R1 and R2 are each hydrogen atom, C1-C8 alkyl or C1-C8 alkenyl. The resist stripping agent easily and efficiently removes resist films and resist residues remaining after etching or after ashing subsequent to etching in manufacturing semiconductor devices at low temperatures in short period of time. The resist stripping agent is resistant to corrosion against materials for substrate, circuits and insulating films.
Claims10
A resist stripping agent comprising:
- a stripping alkanolamine represented by the following formula (II):
- wherein R1 and R2 are each hydrogen atom, C1-C8 alkyl or C1-C8 alkenyl, R3 is C1-C10 alkyl, C1-C10 alkenyl, amino, hydroxyethyl, hydroxy-i-propyl, C1-C10 aminoalkyl, (C1-C10 alkyl)phenyl, phenyl(C1-C10)alkyl, C1-C10 alkoxy, (C1-C10)alkoxy(C1-C10)alkyl, hydroxy(C1-C10)alkyloxy(C1-C10)alkyl, C1-C10 alkylamino, amino(C1-C10)alkyloxy(C1-C10)alkyl, hydroxy(C1-C10)alkylamino(C1-C10)alkyl;
- R4 is hydrogen, —CH2OH, —CH(OH)CH3, C1-C10alkyl, C1-C10 alkenyl, amino, C1-C10 hydroxyalkyl, C1-C10aminoalkyl, (C1-C10 alkyl)phenyl, phenyl(C1-C10)alkyl, C1-C10 alkoxy, (C1-C10)alkoxy(C1-C10)alkyl, hydroxy(C1-C10)alkyloxy(C1-C10)alkyl, C1-C10 alkylamino, amino(C1-C10)alkyloxy(C1-C10)alkyl, hydroxy(C1-C10)alkylamino(C1-C10)alkyl;
- or R3 and R4 together with the nitrogen to which R3 and R4 are bonded may form cyclic amino having 1 to 12 carbon atoms;
- an additive amine selected from the group consisting of methylamine, ethylamine, propylamine, butylamine, ethanolamine, N-methylethanolamine, N-ethylethanolamine, diethanolamine, isopropanolamine, 2-(2-aminoethoxy)ethanol, ethylenediamine, propylenediamine, butylenediamine, diethylenetriamine, hydroxylamine, N,N-diethylhydroxylamine, piperazine and morpholine, the molar ratio of the stripping alkanolamine and the additive amine being 0.01 to 100;
- and
- a water-soluble organic solvent selected from the group consisting of dimethyl sulfoxide, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether and dipropylene glycol monobutyl ether in an amount of 5 to 80% by weight based on the resist stripping agent.
Dependencies are inferred from the claim text.