Method and apparatus for performing run-to-run control in a batch manufacturing environment

An apparatus for controlling manufacturing processes using a hierarchical system, comprising:

• means for processing a first lot of semiconductor devices using a first set of control input parameters;
• means for storing said first set of control input parameters in one of a plurality of hierarchical levels, said first set of control input parameters being available for processing a second lot of semiconductor devices;
• means for acquiring process data from said processing of said first lot of semiconductor devices;
• means for determining a second set of control input parameters for a subsequent lot of semiconductor devices based upon said acquired process data;
• and
• means for storing said second set of control input parameters in one of a plurality of hierarchical levels, said first and second sets of control input settings being available for processing of a third lot of semiconductor devices.

A computer readable program storage device encoded with instructions that, when executed by a computer, performs a method for controlling manufacturing processes using a hierarchical system, comprising:

• processing a first lot of semiconductor devices using a first set of control input parameters;
• storing said first set of control input parameters in one of a plurality of hierarchical levels, said first set of control input parameters being available for processing of a second lot of semiconductor devices;
• acquiring process data from said processing of said first lot of semiconductor devices;
• determining a second set of control input parameters for a subsequent lot of semiconductor devices based upon said acquired process data;
• and
• storing said second set of control input parameters in one of a plurality of hierarchical levels, said first and second sets of control input settings being available for processing of a third lot of semiconductor devices.