Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorYukihiro Yokota
Life of this patent
Estimating the term…
Abstract
An original chuck for holding an original includes a plurality of attracting and holding portions for holding the original, each of the plurality of attracting and holding portions having a supporting member for supporting the original with point contact, and an attracting pad of an elastic material for surrounding the supporting member. The original chuck also includes an adjusting mechanism for adjustably moving at least one of the attracting and holding portions in a direction orthogonal to a supporting surface of a respective supporting member.
Claims12
An original chuck for holding an original, said original chuck comprising:
- a plurality of attracting and holding portions for holding the original, each of said plurality of attracting and holding portions having a supporting member for supporting the original with point contact, and an attracting pad of an elastic material for surrounding said supporting member;
- and
- an adjusting mechanism for adjustably moving at least one of said attracting and holding portions in a direction orthogonal to a supporting surface of a respective supporting member.
An exposure apparatus, comprising:
- an original chuck comprising (i) a plurality of attracting and holding portions for holding the original, each of said plurality of attracting and holding portions having a supporting member for supporting the original with point contact, and an attracting pad of an elastic material for surrounding said supporting member and (ii) an adjusting mechanism for adjustably moving at least one of said attracting and holding portions in a direction orthogonal to a supporting surface of a respective supporting member;
- and
- exposure means for transferring a pattern of the original, held by said original chuck, onto a substrate by exposure.
A semiconductor device manufacturing method, comprising the steps of:
- setting a group of production machines in a semiconductor manufacturing factory, the production machines including an exposure apparatus that includes (1) an original chuck, the original chuck including (i) a plurality of attracting and holding portions for holding the original, each of the plurality of attracting and holding portions having a supporting member for supporting the original with point contact, and an attracting pad of an elastic material for surrounding the supporting member and (ii) an adjusting mechanism for adjustably moving at least one of the attracting and holding portions in a direction orthogonal to a supporting surface of a respective supporting member, and (2) exposure means for transferring a pattern of the original, held by the original chuck, onto a substrate by exposure;
- and
- producing semiconductor devices through the performance of plural processes using the production machine group.
Dependencies are inferred from the claim text.