System for receiving and retaining a substrate

Abstract

The invention refers to a receiving and supporting system for a substrate (17) in an exposure system, which is provided with a handling system for the supply of the substrate (17), with an electrostatic chuck arrangement (1) moveable in X, Y coordinates, for the support of the substrate (17) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface. In regard to the respective supporting system, at least a second electrostatic chuck arrangement (6) is provided, which—similar to the first chuck arrangement (1), for the support of the substrate (17) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement (6) is positioned movable in Z coordinate. In regard to their supporting force, both chuck arrangements (1, 6) are arranged in such a manner, that the substrate (17) is securely positioned when being supported either on the first chuck arrangement (1) or when being supported exclusively on the second chuck arrangement (6).

Dependencies are inferred from the claim text.