Substrate processing apparatus

A substrate processing apparatus configured to coat a substrate with a resist and to subject the substrate to developing processing after the resist is exposed in accordance with a predetermined pattern, said apparatus comprising:

• a substrate carrying section configured to the substrate;
• a processing section having a plurality of processing units vertically stacked and configured to subject the substrate to resist coating and developing processing and thermal processing before and after the resist coating and developing processing;
• a main transfer machine disposed to freely move in a vertical direction in said processing section, and configured to transfer the substrate from one of said processing units to another of said processing units;
• and
• a secondary transfer machine disposed to freely move in a vertical direction in said substrate carrying in/out section, configured to deliver the substrate between said substrate carrying section and said processing section and to transfer the substrate from one of said processing units to another of said processing units in said processing section when said carrying section does not deliver the substrate.

A substrate processing apparatus configured to coat a substrate with a resist and to subject the substrate to developing processing after the resist is exposed in accordance with a predetermined pattern, said apparatus comprising:

• a substrate carrying section configured to load and unload the substrate;
• a processing section including a plurality of processing units vertically stacked and configured to subject the substrate to resist coating and developing processing and thermal processing before and after the resist coating and developing processing;
• a main transfer machine configured to freely move in a vertical direction in said processing section, and to transfer the substrate from one of said processing units to another of said processing units;
• an interface section configured to deliver the substrate between said processing section and an aligner;
• and
• a secondary transfer machine configured to freely move in a vertical direction in said interface section, to deliver the substrate between said interface section and said processing section and to transfer the substrate from one of said processing units to another of said processing units in said processing section when said carrying section does not deliver said substrate.