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US 6,270,583 B1Granted
Closed type semiconductor wet thermal oxidation apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsByung-doo Choi, Jeong-kwan Lee, Keum-hee Lee
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Abstract
A compound semiconductor wet thermal oxidation apparatus includes a chamber unit having an inside tube containing water and supporting a specimen and an outside tube encompassing the inside tube forming a seal, and a heating unit having a furnace for heating the specimen and the water.
Claims9
A compound semiconductor wet thermal oxidation apparatus comprising:
- a chamber unit including an inside tube containing liquid water and supporting a specimen and an outside tube encompassing said inside tube, said outside tube forming a seal, said liquid water being a source of steam for the wet thermal oxidation reaction;
- and a heating unit including a furnace for heating the specimen and the liquid water.
Dependencies are inferred from the claim text.