Developer for photosensitive polyimide precursor, and method of using it for patterning
AssigneeHitachi Chemical Dupont Microsystems, Ltd.
InventorsHiroshi Komatsu, Takeharu Motobe
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Abstract
The invention provides a developer for photosensitive polyimides, with which polyimide patterning for interlayer insulating films for multi-layered circuit boards and for .alpha.-ray shield layers, buffer coat layers and others for semiconductor memory devices is attained within a shorter period of time than with conventional developers. It provides a developer for photosensitive polyimide precursors, which comprises two or more solvents including at least an aprotic polar solvent, and in which the mixed solution of the solvents has a polar component solubility parameter, .delta.P, of not smaller than 7, and provides a patterning method of using the developer.
Claims8
A developer for photosensitive polyimide precursors, which comprises two or more solvents including at least an aprotic polar solvent, and in which the mixed solution of the solvents has a polar component solubility parameter, .delta.P, of not smaller than 7.
A patterning method comprising exposing a film of a photosensitive polyimide precursor composition to active rays via a pattern mask therebetween, followed by processing the film with a developer to thereby remove the non-exposed area of the film, wherein the developer used comprises two or more solvents including at least an aprotic polar solvent, and the mixed solution of the solvents for the developer has a polar component solubility parameter, .delta.P, of not smaller than 7.
Dependencies are inferred from the claim text.