Substrate treating method and apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsTsuyoshi Mitsuhashi, Takuya Wada, Koji Hashimoto, Naoyuki Osada
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Abstract
A substrate treating method and apparatus for treating a substrate by supplying a developing solution thereto while spinning the substrate. A nozzle having a plurality of discharge openings for discharging the developer is disposed such that the discharge openings are at different distances from the spin center of the substrate. The developer is discharged from the nozzle while the latter is moved radially of the substrate. The discharge openings then describe loci not overlapping one another over the substrate. The developer is evenly supplied over the substrate to promote the uniformity of development on the substrate surface.
Claims13
A substrate treating apparatus for treating a substrate by supplying a treating solution thereto, comprising:
- spin support means for supporting and spinning the substrate;
- treating solution supply means having a plurality of discharge openings for discharging the treating solution, said discharge openings being arranged at different distances from a spin center of said substrate, in two rows and in a staggered relationship;
- and
- moving means for moving said treating solution supply means radially of said substrate.
A substrate treating apparatus for treating a substrate by supplying a treating solution thereto, comprising:
- spin support means for supporting and spinning the substrate;
- treating solution supply means having a plurality of discharge openings for discharging the treating solution, said discharge openings being arranged at different distances from a spin center of said substrate, and
- moving means for moving said treating solution supply means radially of said substrate,
- wherein said treating solution supply means comprises a nozzle having said plurality of discharge openings;
- and
- wherein said nozzle includes a nozzle body having said plurality of discharge openings formed in a bottom thereof, said nozzle body defining a trap for receiving said treating solution, a plurality of discharge passages extending upward from said plurality of discharge openings, respectively, and a plurality of communicating passages for communicating said discharge passages with said trap, said plurality of communicating passages being reversing passages for leading said treating solution from a lower end of said trap to upper ends of said discharge passages.
Dependencies are inferred from the claim text.