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US 5,867,276 AGranted
Method for broad wavelength scatterometry
AssigneeBio-Rad Laboratories, Inc.
InventorsJohn R. McNeil, Scott R. Wilson, Richard H. Krukar
Life of this patent
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Abstract
An optical scatterometer system enables analysis of a sample material at various wavelengths without rotating or otherwise moving the sample material.
Claims11
A method for broad wavelength scatterometry analysis of a patterned sample material having unknown parameter values, the method comprising:
- illuminating the sample material with an incident light beam having a broad spectral composition;
- measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material;
- determining the range and resolution of each of one or more sample parameters to be treated as one or more variables to thereby parameterize the sample material;
- generating calibration data;
- training a multivariate statistical analysis technique using the generated calibration data;
- and
- submitting the measured diffraction characteristics of the sample material to the trained statistical analysis technique to determine the parameter values of the sample material.
4 more elements
A method for broad wavelength scatterometry monitoring of a process for fabricating a patterned sample material, the method comprising:
- illuminating the sample material with an incident light beam having a broad spectral composition;
- measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material;
- utilizing the spectrally-resolved diffraction characteristic of the sample material to determine if the process is within specified tolerances.
Dependencies are inferred from the claim text.