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US 5,858,476 AGranted
Method and apparatus for making and depositing compounds
OwnerHarold E. Siessinventor
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OwnerHarold E. Siessinventor
Estimating the term…
Apparatus and methods for treatment of materials by producing gaseous product material in the form of high purity molecules including metal oxides, metal carbides, etc., using catalytic and non-catalytic processes, and stoichiometrically depositing the gaseous product material on articles, substrates or base materials in the fields of semi-conductors, superconductors, thin optical films, wear and corrosion and the like. The deposition of high purity gas phase material produced by the disclosed methods are useful in forming common refractory layers, films, and bodies such as ferroelectric, superconducting and semiconductor materials, to name a few. Catalytic reaction for the formation and desorption of the molecules, etc., may be monitored by the use of work function measurements. Such measurements also provide a basis for detecting the presence of impurities, gasification of the surface catalyst, and conditions which favor maximum gas phase molecular formation. Catalytic surfaces are purified and cleaned with purification processes including selective gasification and desorption of impurities therefrom.
A deposition process for depositing materials upon a substrate, said process comprising steps of providing a catalytic surface ion source;
A deposition process to deposit compounds by catalytic deposition upon a substrate, said process comprising steps of:
A deposition process to deposit compounds by catalytic deposition upon a substrate, said method comprising steps of:
A deposition process to deposit compounds by catalytic deposition upon a substrate, said process comprising steps of:
Dependencies are inferred from the claim text.