Vacuum processing equipment, film coating equipment and deposition method

A vacuum processing device for a substrate comprising:

• a plurality of vacuum units, at least one of the plurality of vacuum units enabling processing of the substrate therein;
• means for carrying the substrate to the vacuum units;
• a plurality of infrared radiation thermometers, each of the infrared radiation thermometers being provided for measuring a temperature of the substrate and for providing an output indicative thereof, at least one of the plurality of infrared radiation thermometers being disposed at a position with respect to the at least one of the plurality of vacuum units enabling processing of the substrate for measuring a temperature of the substrate during processing of the substrate and for providing an output indicative thereof, and at least one other of the plurality of infrared radiation thermometers being disposed at a different position from the position of the at least one of the infrared radiation thermometer for measuring a temperature of the substrate at the different position at least one of before and after processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate and for providing an output indicative thereof;
• and
• determination means for comparing the output provided by the at least one of the plurality of infrared radiation thermometers for measuring the temperature of the substrate during the processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate with the output provided by the at least one other of the plurality of infrared radiation thermometers for measuring the temperature of the substrate at the different position at least one before and after the processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate.