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US 5,705,317 AGranted
Radiation-sensitive mixture
AssigneeAgfa-Gevaert
InventorsMathias Eichhorn, Gerhard Buhr
Life of this patent
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Abstract
A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.
Claims21
A radiation-sensitive mixture which comprises
- (a) a compound having at least one acid-cleavable C--O--C bond of the formula (I) ##STR3## where R.sup.1 is an optionally substituted alkyl radical,
- R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
- R.sup.3 is an n-valent, optionally polymeric, aliphatic or aromatic radical, and
- n is an integer from 2 to 100
- (b) a compound which forms a strong acid on exposure to actinic radiation.
2 more elements
A composition prepared by mixing
- (a) a compound having at least one acid-clearable C--O--C bond of the formula (I) ##STR4## where R.sup.1 is an optionally substituted alkyl radical,
- R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
- R.sup.3 is an n-valent, optionally polymeric, aliphatic or aromatic radical, and
- n is an integer from 2 to 100, and
- (b) a compound which forms a strong acid on exposure to actinic radiation.
2 more elements
Dependencies are inferred from the claim text.