High temperature, high rate, epitaxial synthesis of diamond in a laminar plasma
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorKeith A. Snail
Life of this patent
Estimating the term…
Loading patent…
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorKeith A. Snail
Estimating the term…
A method for synthesizing large, single crystal diamond comprising mixing carbon source and a hydrogen source to form a mixture. The mixture is excited and reacted to form a reactive species in a laminar plasma plume. A substrate having a diamond seed crystal is disposed in the laminar plasma plume while maintaining the diamond seed crystal at a growth temperature between 1100.degree. and 1700.degree. C. for the deposition of diamond, thereby inducing deposition of single crystal diamond on the diamond seed crystal. An apparatus for synthesizing diamond (10;15) comprising a plasma torch (30;31) for producing a laminar plasma plume (44;54). A carbon source (CH.sub.4) and a hydrogen source (H.sub.2,CH.sub.4) are excited and reacted in the laminar plasma plume (44;54) so as to form a reactive species in the laminar plasma plume (44;54). A positioning device is used to dispose a substrate (11) having a diamond seed crystal in the laminar plasma plume (44;54), while a temperature maintaining device (12) is used to maintain the diamond seed crystal at a temperature between 1100.degree. and 1700.degree. C., thereby inducing deposition of single crystal diamond on the diamond seed crystal mounted on substrate (11).
A method for homoepitaxial synthesis of single crystal diamond on a diamond seed crystal, comprising the steps of:
A method for epitaxial synthesis of a single crystal diamond on a substrate including a plurality of diamond seed crystals, comprising the step of:
A method for homoepitaxial synthesis of single crystal diamond on a diamond seed crystal, comprising:
Dependencies are inferred from the claim text.