Method of ashing resist and apparatus therefor
AssigneeSharp Kabushiki Kaisha
InventorsMasaru Kajitani, Satoshi Yabuta, Katsuhiro Kawai, Masaya Okamoto
Life of this patent
Estimating the term…
Abstract
An object of the invention is to enhance the ashing speed of resist. A parallel plate electrode type plasma etching device is used in a mixed gas atmosphere of SF.sub.6 gas and O.sub.2 gas with the concentration of SF.sub.6 gas defined within 5 vol. % to 15 vol. %. A substrate to be treated, coated with a resist of hydrocarbon polymer is placed on a lower electrode. A high frequency electric power is applied to an upper electrode and lower electrode placed parallel to each other, and a plasma of mixed gas is generated in the reactor. A chemical reaction is induced in the resist and active ions of the plasma to vaporize and remove the resist.
Claims3
A method of ashing a resist comprising the steps of:
- placing a substrate, coated with the resist, to be treated in a mixed gas atmosphere, said mixed gas atmosphere containing SF.sub.6 gas and O.sub.2 gas with the concentration of the SF.sub.6 gas in the mixed gas being selected to be 7.0 vol. %;
- generating plasma of the mixed gas;
- and
- subjecting the resist to the plasma,
- whereby the resist is ashed.
An apparatus for ashing a resist wherein the resist to be treated coats a substrate and is ashed by plasma, said apparatus comprising:
- a first planar electrode on which the substrate to be treated is mounted;
- a second planar electrode disposed at the substrate-mounting surface side of the first electrode, the second electrode opposing the first electrode;
- power supplying means for supplying the first electrode and the second electrode with predetermined power;
- heating means for heating the substrate to be treated which is mounted on the first electrode;
- a reactor for containing and sealing at least the first electrode, the second electrode and the substrate to be treated;
- and
- reacting-gas supplying means for supplying the reactor with a mixed gas which contains O.sub.2 gas and SF.sub.6 gas with the concentration of the SF.sub.6 gas in the mixed gas being selected to be 7.0 vol. %.
Dependencies are inferred from the claim text.