Point-of-use purification
AssigneeShipley Company, L.L.C.
InventorsPeter Trefonas, III, Richard J. Carey
Life of this patent
Estimating the term…
Abstract
The invention is for a process of removal of dissolved contaminants from an organic solution. The process of the invention involves placing a module containing an ion exchange resin, activated carbon or a mixture of the two between a container from which the organic solution is dispensed and the point at which the solution is to be used. The solution is then passed through the module to remove contaminants. The inventions is useful for removal of dissolved contaminants from organic solutions requiring high purity for use.
Claims12
A process for coating a liquid organic photoresist composition onto a wafer for integrated circuit manufacture, said process comprising the steps of providing a dispensing means for dispensing said organic composition, a wafer upon which said organic composition is to be coated, and purification means disposed between said dispensing means and said wafer, said purification means comprising a module containing a member selected from the group consisting of at least one ion exchange resin, an activated carbon adsorbent and mixtures thereof, passing said organic photoresist composition from said dispensing means through said purification means to said wafer and drying said photoresist coating.
Dependencies are inferred from the claim text.