Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride

A method for producing a photoresist image on a substrate commensurate in scope with the developing step wherein the imagewise exposed areas of the positive working photosensitive composition are removed with an aqueous alkaline developer, which comprises coating a substrate with a positive working photosensitive composition which composition comprises in admixture:

• (a) a photosensitive component comprising a diazo ester of a benzolactone ring compound, where the diazo ester is a compound containing at least one hydroxy group on the benzolactone ring have been esterified with diazo sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5 diazo sulfonyl chloride or a mixture thereof, said photosensitive component being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition;
• and
• (b) a water insoluble, aqueous alkali soluble novolak resin;
• said novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition;
• and (c) a solvent composition;
• and heat treating said coated substrate until substantially all of said solvent composition is removed;
• imagewise exposing said photosensitive composition to actinic radiation;
• and removing the imagewise exposed areas of said composition with an aqueous alkaline developer.