Identifying and compensating for slip-plane dislocations in photolithographic mask alignment
AssigneeLSI Logic Corporation
InventorsMichael D. Rostoker, Nicholas F. Pasch, Joe Zelayeta
Life of this patent
Estimating the term…
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AssigneeLSI Logic Corporation
InventorsMichael D. Rostoker, Nicholas F. Pasch, Joe Zelayeta
Estimating the term…
Techniques for identifying and determining the orientation, magnitude, and direction of slip plane dislocations transecting semiconductor dies are described, whereby a four point alignment pattern is examined for "squareness" and size integrity. Lack of squareness or significant change in apparent size of various aspects of the alignment pattern indicate slip-plane dislocations. The magnitude, orientation and direction of the dislocations are determined geometrically from measurement of the alignment pattern. Various other aspects of the invention are directed to optimal alignment of a photolithographic mask to a die which has experienced a slip-plane dislocation, and to discrimination between slip-plane dislocation and die-site rotation.
A mask alignment marking arrangement for detecting slip plane dislocation on a rectangular die, comprising:
A method of detecting slip dislocations on a rectangular semiconductor die, comprising:
A method of discriminating between slip dislocation and rotation of a die site, comprising:
Dependencies are inferred from the claim text.