Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same

A positive-type photosensitive electrodeposition coating composition comprising

• (A) a resin component containing in the same molecule at least one photosensitive group and an anion-forming group, the photosensitive group being selected from the group consisting of an ortho-benzoquinonediazidesulfone unit represented by the general formula ##STR24## an ortho-naphthoquinonediazidesulfone unit represented by the general formula ##STR25## the amount of the photosensitive group in the resin component being 5 to 60% by weight, the content of the anion-forming group being 0.2 to 2.5 mols per Kg of the solid content of the resin, and the resin having a number-average molecular weight of 3,000 to 100,000, and
• (B) at least one of the nitrogen-containing compounds represented by the following general formulae (1) to (6):
• ##STR26## hydroxyl group, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom, a chlorine atom or an alkyl group having 1 to 6 carbon atoms, ##STR27## wherein R.sub.4 and R.sub.5 independently represent a hydrogen atom, or an alkyl group having 1 to 6 carbon atoms, ##STR28## wherein R.sub.6, R.sub.7 and R.sub.8 independently represent a hydrogen atom, a hydroxyl group or an alkyl group having 1 to 12 carbon atoms, ##STR29## wherein R.sub.9, R.sub.10 and R.sub.11 independently represent a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 12 carbon atoms or ##STR30## an alkoxy group having 1 to 12 carbon atoms, wherein R.sub.12 represents a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms, ##STR31## wherein R.sub.13 and R.sub.14 independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms and n is an integer of 1 to 3.