US 5,344,677 A · Photochemically stable deep ultraviolet pellicles for excimer lasers

Abstract

An embodiment of the present invention is a pellicle for use on a photomask reticle used in conjunction with deep ultraviolet light wavelengths. The membrane of the pellicle comprises a purified fluoropolymer that has been spin coated on a substrate of nitrocellulose and then separated and mounted on an aluminum frame. The aluminum frame has vents that filter air of contaminants and which allow an equalization of air pressure on both sides of the pellicle membrane when a peel-off backliner is in place on the opposite side of the frame. A permanent bond is made between the membrane and frame and a sticky adhesive is used to keep the backliner on the frame until peel-off. The sticky adhesive is such that the backliner may be re-attached a plurality of times.

Claims10

Dependent claims

A deep ultraviolet pellicle, comprising:

a perimeter frame having an inside cavity and a first and a second surface that respectively lie in first and second planes which, together with the frame perimeter, completely bound the volume of said inside cavity;
a film membrane attached to said first surface of the frame for sealing out the outside environment from said inside cavity;
and
particle trapping vent means including a channel along the length of the frame with holes at opposite ends of said channel, one hole leading from inside of the pellicle to said channel and one from the outside of the pellicle to said channel for relieving air pressure differences and excluding particles in air passing through from entering said inside cavity from the outside environment.

1 more element

Dependencies are inferred from the claim text.

Photochemically stable deep ultraviolet pellicles for excimer lasers

Life of this patent

Photochemically stable deep ultraviolet pellicles for excimer lasers

Life of this patent

Abstract

Claims10