Vapor growth apparatus for semiconductor devices
AssigneeKabushiki Kaisha Toshiba
InventorsMitsuo Sato, Kiyoshi Yoshikawa, Yuusuke Sato
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AssigneeKabushiki Kaisha Toshiba
InventorsMitsuo Sato, Kiyoshi Yoshikawa, Yuusuke Sato
Estimating the term…
A vapor growth apparatus has a susceptor which rotates in a water cooled reaction tube with holding semiconductor susbstrates thereon. A heater is provided in order to heat the susceptor and to maintain a predetermined temperature. This heater is comprised of an inner heater, which heats the inner part of the susceptor, and a peripheral heater, which heats the peripheral part of the susceptor. The peripheral heater is made thicker than the inner heater. In addition, these inner and peripheral heaters are connected in parallel with each other. So, the peripheral heater can generate more heat than the inner heater so as to compensate the temperature decrease in the peripheral part of the susceptor, without loosing the mechanical strength of the whole heater.
A vapor growth apparatus for semiconductor devices, comprising:
A vapor growth apparatus for semiconductor devices, comprising:
A vapor growth apparatus for semiconductor devices, comprising:
Dependencies are inferred from the claim text.