Gas seal for continuous chemical vapor deposition reactors
AssigneeTexas Instruments Incorporated
InventorThomas F. Wilkinson
Life of this patent
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Abstract
Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.
Claims9
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising:
- a first gas inlet communicating between a source of reaction gas and said reaction chamber;
- and
- a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
A seal for preventing reactive gas flow out of a chemical reaction chamber to the atmosphere through an interface where said reaction chamber is attached to a reaction chamber junction, said seal comprising;
- a first gas inlet communicating between a source or reaction gas and said reaction chamber;
- and
- a second gas inlet coupled to a source of an inert second gas and positioned to introduce said inert second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
In a continuous chemical vapor deposition reactor having at least one reaction chamber open at two ends and each open end of the reaction chamber connected to and sealed with a reaction chamber junction, a seal for sealing the chemical reaction chamber from the atmosphere at the interface where the reaction chamber open ends are attached to the reaction chamber junction, said seal comprising:
- a first gas inlet communicating between a source of reaction gas and said reaction chamber;
- and
- a second gas inlet coupled to a source of a second gas and positioned to introduce said second gas into said reaction chamber between said first gas inlet and said interface, said second gas source being at a pressure greater than the pressure of said reaction gas source.
Dependencies are inferred from the claim text.