Rotating furnace tube having a non-rotating slidable work holder for processing semiconductor substrates
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsToshio Otaki, Hitoshi Ikeda, Masato Yamada, Takao Takenaka
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Abstract
An semiconductor substrate processing apparatus of the type including a furnace tube associated with a fluid supply unit and a fluid discharge unit, wherein the furnace tube is rotatably supported by pairs of confronting rollers and rotated by a motor under the control of a controller in order to achieve various kinds of processing of semiconductor substrates within the furnace tube. With this rotatable furnace tube, the apparatus exhibits high radial temperature uniformity and is able to prevent deformation of the furnace tube.
Claims8
An apparatus for processing a semiconductor substrate, comprising:
- a furnace tube;
- supply means for supplying a fluid into said furnace tube;
- discharge means for discharging said fluid from said furnace tube;
- support means for rotatably supporting said furnace tube;
- drive means for rotating said furnace tube about its longitudinal axis;
- controlling means for controlling operation of said drive means;
- and
- a holder slidably and non-rotatably received in said furnace tube for holding a plurality of semiconductor substrates, said furnace tube including a guide rail extending longitudinally along an inside surface of said furnace tube for slidably guiding therealong said holder, and elongate setting means having an end formed with an engagement portion lockingly engageable with an end of said holder, said elongate setting means being movable longitudinally to move said holder along said guide rail for setting the holder in a desired position.
Dependencies are inferred from the claim text.