Apparatus having a vacuum chamber
AssigneeKabushiki Kaisha Shibaura Seisakusho
InventorsKyoji Kinokiri, Hisashi Ubukata
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AssigneeKabushiki Kaisha Shibaura Seisakusho
InventorsKyoji Kinokiri, Hisashi Ubukata
Estimating the term…
An apparatus having a vacuum chamber is provided which comprises a vacuum chamber that can hold a pressure therein at a pressure different from the outside pressure, a load-lock chamber formed at a portion of the vacuum chamber, for transferring in and out an object between the outside and the vacuum chamber while holding the pressure in the vacuum chamber at a pressure different from the outside pressure, and a piping apparatus having valve mechanism, which performs the intake and exhaust of gas with respect to the load-lock chamber. The piping apparatus comprises a passage formed in the wall of the vacuum chamber, the passage communicating with the load-lock chamber and being exposed to the outer wall of the upper lid so as to be connected to means for inhaling and exhausting gas, valve members disposed on the outer wall, for directly opening and closing the passage, and means for actuating the valve members. The passage is incorporated in the wall of the vacuum chamber, so that the entire apparatus can be small-sized and the conductance with respect to the gas-flow in the passage can be significantly increased.
A sputtering apparatus having a vacuum chamber, comprising:
Dependencies are inferred from the claim text.